aldsim’s documentation

aldsim provides a suite of simple models for atomic layer deposition processes.

Atomic layer deposition (ALD) is a thin film growth technique that relies on self-limited surface kinetics. It plays a key role in areas such as microelectronics, and it is applied for energy, energy storage, catalysis, and decarbonization applications.

aldsim implements a series of models to help explore ALD in various contexts and reactor configurations.

It has grown from a collection of papers that we have published over the past 10 years.

Contents

• About aldsim
  • Basic structure
  • Status
  • Quick install
  • Acknowledgements
  • Copyright and license
• About Atomic Layer Deposition
  • Anatomy of a typical ALD Process
  • ALD surface kinetics in aldsim
• Tutorial
  • Introduction
  • ALD Surface kinetics
  • A simple reactor model
  • Example: particle coating by ALD
• Single exposure models
  • 0D constant partial pressure model
  • ALD of particles in fluidized bed reactors
  • ALD of particles in a rotating drum reactor
  • Spatial ALD reactor model
  • ALD in high aspect ratio vias
• Core models
  • Particle coating
  • Example
• An interactive introduction to aldsim using jupyter notebook
• API
  • Particle Models
  • ALD in high aspect ratio features
• TODO List

Indices and tables

• Index

• Module Index

• Search Page