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aldsim's documentation
======================

aldsim provides a suite of simple models for atomic layer deposition
processes.

Atomic layer deposition (ALD) is a thin film growth technique that
relies on self-limited surface kinetics. It plays a key role
in areas such as microelectronics, and it is applied for energy,
energy storage, catalysis, and decarbonization applications.

aldsim implements a series of models to help explore ALD in 
various contexts and reactor configurations.

It has grown from a collection of papers that we have published over
the past 10 years.


Contents
========

.. toctree::
   :maxdepth: 2

   intro.rst
   ald.rst
   tutorial.rst
   models.rst
   core.rst
   example.ipynb
   api
   todo.rst


Indices and tables
==================

* :ref:`genindex`
* :ref:`modindex`
* :ref:`search`