About aldsim
============

aldsim is a simple library that implements models for self-limited processes characteristic of atomic layer
deposition and atomic layer etching.

Basic structure
---------------

aldsim provides two separate functionalities: its ``core`` module contains
various models implemented using nondimensional variables. These models
highlight some of the scaling laws in atomic layer deposition.

Through its ``chem`` module, it applies the models in ``core`` to various idealized
models of self-limited surface kinetics.

Status
------

``aldsim`` is still in development. Over the next few months it will
be expanded to incorporate a variety of models.

Quick install
-------------

Through pypi:

.. code-block:: bash

   pip install aldsim

Alternatively, it can be directly installed from its github repository: https://github.com/anglyan/aldsim

Acknowledgements
----------------

* Argonne Laboratory Directed Research and Development program

Copyright and license
---------------------

Copyright © 2024-26, UChicago Argonne, LLC

``aldsim`` is distributed under the terms of the BSD License.

Argonne Patent & Intellectual Property File Number: SF-24-041