About aldsim¶
aldsim is a simple library that implements models for self-limited processes characteristic of atomic layer deposition and atomic layer etching.
Basic structure¶
aldsim provides two separate functionalities: its core module contains
various models implemented using nondimensional variables. These models
highlight some of the scaling laws in atomic layer deposition.
Through its chem module, it applies the models in core to various idealized
models of self-limited surface kinetics.
Status¶
aldsim is still in development. Over the next few months it will
be expanded to incorporate a variety of models.
Quick install¶
Through pypi:
pip install aldsim
Alternatively, it can be directly installed from its github repository: https://github.com/anglyan/aldsim
Acknowledgements¶
Argonne Laboratory Directed Research and Development program
Copyright and license¶
Copyright © 2024-26, UChicago Argonne, LLC
aldsim is distributed under the terms of the BSD License.
Argonne Patent & Intellectual Property File Number: SF-24-041